ASTM E1636-94(1999)
Historical Standard: ASTM E1636-94(1999) Standard Practice for Analytically Describing Sputter-Depth-Profile Interface Data by an Extended Logistic Function
SUPERSEDED (see Active link, below)
ASTM E1636
1. Scope
1.1 This practice covers a systematic method for analyzing sputter-depth-profile interface data and for accurately characterizing the shape of the interface region. Interface profile data are described with an appropriate analytic function; the parameters of this function define the interface width, its asymmetry, and its depth from the original surface. The use of this practice is recommended in order that the shapes of composition profiles of interfaces acquired with different instruments and techniques on different materials can be unambiguously compared and interpreted.
1.2 This practice is intended to be used to describe the shape of depth profile data obtained at an interface between two dissimilar materials for that case in which the measured concentration of the outer material goes from 100 to 0% and the inner material goes from 0 to 100%.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
E673 Terminology Relating to Surface Analysis
E1127 Guide for Depth Profiling in Auger Electron Spectroscopy
E1162 Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
E1438 Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
Keywords
depth-profile interface data; linescan interface data; logistic function; Composition analysis--metals/alloys; Extended logistic function; Interface profile analysis; Logistic function; SIMS (secondary ion mass spectrometry); Sputter depth profiling data;
ICS Code
ICS Number Code 71.040.50 (Physicochemical methods of analysis)
DOI: 10.1520/E1636-94R99
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