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BS ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry. Instrumental requirements, alignment and positioning, data collection, data analysis and reporting >
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BS ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry. Instrumental requirements, alignment and positioning, data collection, data analysis and reporting, 2020
- undefined
- Foreword
- Introduction
- 1 Scope
- 2 Normative references
- 3 Terms and definitions
- 3.1 Terms and definitions
- 3.2 Symbols and abbreviated terms
- 4 Instrumental requirements, alignment and positioning guidelines
- 4.1 Instrumental requirements for the scanning method
- 4.1.1 Schematic diagrams
- 4.1.2 Incident beam — Requirements and recommendations
- 4.1.3 Specimen — Requirements and recommendations
- 4.1.4 Goniometer — Requirements
- 4.1.5 Detector — Requirements
- 4.2 Instrument alignment
- 4.3 Specimen alignment
- 5 Data collection and storage
- 5.1 Preliminary remarks
- 5.2 Data scan parameters
- 5.3 Dynamic range
- 5.4 Step size (peak definition)
- 5.4.1 Fixed intervals scan
- 5.4.2 Continuous scan
- 5.5 Collection time (accumulated counts)
- 5.6 Segmented data collection
- 5.7 Reduction of noise
- 5.8 Detectors
- 5.9 Environment
- 5.10 Data storage
- 5.10.1 Data output format
- 5.10.2 Headers
- 6 Data analysis
- 6.1 Preliminary data treatment
- 6.2 Specimen modelling
- 6.2.1 General
- 6.2.2 Interface width models
- 6.3 Simulation of XRR data
- 6.4 General examples
- 6.5 Data fitting
- 7 Information required when reporting XRR analysis
- 7.1 General
- 7.2 Experimental details
- 7.3 Analysis (simulation and fitting) procedures
- 7.4 Methods for reporting XRR curves
- 7.4.1 Independent and dependent variables
- 7.4.2 Graphical plotting of XRR data
- Annex A (informative) Example of report for an oxynitrided silicon wafer
- Bibliography [Go to Page]