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Description of ASTM-F1709 2008ASTM F1709 - 97(2008)Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film ApplicationsActive Standard ASTM F1709 | Developed by Subcommittee: F01.17 Book of Standards Volume: 10.04 ASTM F1709Abstract This specification covers high purity titanium sputtering targets for use as raw material in the fabrication of semiconductor electronic thin films. Material covered by this specification comprises Grades 4N, 4N5, and 5N titanium sputtering targets, the grades of which are based on the total metallic impurity content. The target shall be manufactured free of any contaminates such as dirt or oils and with average and maximum grain sizes in conformity with the requirements specified. The target shall be analyzed for trace metallic impurities, carbon, oxygen, sulfur, nitrogen, and hydrogen and shall conform to the grade requirements and the acceptable and minimum detection limits specified. This abstract is a brief summary of the referenced standard. It is informational only and not an official part of the standard; the full text of the standard itself must be referred to for its use and application. ASTM does not give any warranty express or implied or make any representation that the contents of this abstract are accurate, complete or up to date. 1. Scope 1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices. 1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
ASTM Standards E112 Test Methods for Determining Average Grain Size Keywords coating; sputtering; target; thin film; titanium; Electronic materials/applications--specifications; Electronic thin-film applications--specifications; High-purity titanium; Sputtering process/targets--specifications; Thin film applications; Titanium sputtering targets; Titanium (Ti)/alloys--specifications; ICS Code ICS Number Code 31.120 (Electronic display devices) DOI: 10.1520/F1709-97R08 ASTM International is a member of CrossRef. ASTM F1709This book also exists in the following packages...Subscription InformationMADCAD.com ASTM Standards subscriptions are annual and access is unlimited concurrency based (number of people that can access the subscription at any given time) from single office location. For pricing on multiple office location ASTM Standards Subscriptions, please contact us at info@madcad.com or +1 800.798.9296.
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