ASTM F1593-97(2002)
Historical Standard: ASTM F1593-97(2002) Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer
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ASTM F1593
1. Scope
1.1 This test method covers measuring the concentrations of trace metallic impurities in high purity aluminum.
1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS).
1.3 The aluminum matrix must be 99.9 weight % (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, silicon or copper, greater than 1000 weight ppm in concentration.
1.4 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to affect the reliability of high purity aluminum analyses.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
E135 Terminology Relating to Analytical Chemistry for Metals, Ores, and Related Materials
E177 Practice for Use of the Terms Precision and Bias in ASTM Test Methods
E691 Practice for Conducting an Interlaboratory Study to Determine the Precision of a Test Method
E1257 Guide for Evaluating Grinding Materials Used for Surface Preparation in Spectrochemical Analysis
Keywords
aluminum; electronics; glow discharge mass spectrometer (GDMS); purity analysis; sputtering target; trace metallic impurities; Aluminum electrical conductors (semiconductors); Glow discharge mass spectrometer (GDMS); High-purity aluminum; Impurities--electronic materials/applications; Mass spectrometry--electronic materials/applications; Purity analysis--electronic materials/applications; Sputtering process/targets; Trace metallic impurities;
ICS Code
ICS Number Code 77.040.99 (Other methods of testing metals)
DOI: 10.1520/F1593-97R02
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