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Description of ASTM-F2113 2011ASTM F2113 - 01(2011)Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film ApplicationsActive Standard ASTM F2113 | Developed by Subcommittee: F01.17 Book of Standards Volume: 10.04 ASTM F2113Abstract This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials. This standard sets purity grade levels, analytical methods and impurity content reporting method and format. The grade designation is a measure of total metallic impurity content. It does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance. Analysis for trace metallic impurities and gases shall be performed on samples that represent the finished sputtering target. Carbon, oxygen, and sulfur shall be analysed by fusion and gas extraction/infrared spectroscopy. Nitrogen and hydrogen shall be analysed by fusion and gas extraction. This abstract is a brief summary of the referenced standard. It is informational only and not an official part of the standard; the full text of the standard itself must be referred to for its use and application. ASTM does not give any warranty express or implied or make any representation that the contents of this abstract are accurate, complete or up to date. 1. Scope 1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein. 1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
ASTM Standards F1593 Test Method for Trace Metallic Impurities in Electronic Grade Aluminum by High Mass-Resolution Glow-Discharge Mass Spectrometer Keywords electronics; purity analysis; purity grade; sputtering; target; thin film; Electronic thin-film applications; High-purity metallic sputtering targets; Impurities--electronic materials/applications; Semiconductor device testing; Sputtering process/targets; Target specifications; Thin film applications; ICS Code ICS Number Code 29.045 (Semiconducting materials) DOI: 10.1520/F2113-01R11 ASTM International is a member of CrossRef. ASTM F2113This book also exists in the following packages...Subscription InformationMADCAD.com ASTM Standards subscriptions are annual and access is unlimited concurrency based (number of people that can access the subscription at any given time) from single office location. For pricing on multiple office location ASTM Standards Subscriptions, please contact us at info@madcad.com or +1 800.798.9296.
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