ASTM F1513-99
Historical Standard: ASTM F1513-99 Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
SUPERSEDED (see Active link, below)
ASTM F1513
1. Scope
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).
1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.
1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
ASTM Standards
D1971 Practices for Digestion of Water Samples for Determination of Metals by Flame Atomic Absorption, Graphite Furnace Atomic Absorption, Plasma Emission Spectroscopy, or Plasma Mass Spectrometry
Keywords
aluminum; coating; evaporation; sputtering; targets; thin films; vacuum coating; Aluminum electrical conductors (semiconductors); Electronic materials/applications--specifications; Electronic thin-film applications--specifications; Evaporators/evaporation--specifications; Sputtering process/targets--specifications; Targets; Vacuum electronic applications;
ICS Code
ICS Number Code 31.200 (Integrated circuits. Microelectronics)
DOI: 10.1520/F1513-99
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